| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3af3390937c06df72b00e23a42cf63ef |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-11 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0236
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0233 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023 |
| filingDate |
1994-04-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
1994-11-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0f8371ae498950495a5d23356cd1cb37
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_046195844a82e40462b9f6e609e93155
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ba799d4438df5b8abdcbacfb49e4f586 |
| publicationDate |
1994-11-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-5368993-A |
| titleOfInvention |
Method of forming relief image having line width less than 0.35 microns utilizing copolymer binder having phenolic and nonaromatic cyclic alcohol units |
| abstract |
The present invention relates to photoresists particularly suitable for deep U.V. exposure and having the capability of forming highly resolved features. The invention is characterized by use of a resist resin binder that comprises a nonaromatic cyclic alcohol-phenol copolymer that has a relatively low molecular weight and narrow distribution of molecular weight and cyclic alcohol concentration. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6794459-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2003018153-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6074800-A |
| priorityDate |
1993-01-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |