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publicationDate 1994-10-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-5358754-A
titleOfInvention Method for forming diamond films by vapor phase synthesis
abstract A method for forming diamond films by vapor phase synthesis comprising a process of forming the diamond films on a substrate by direct current discharge plasma, in an atmosphere of a reaction gas including a gas containing at least carbon and hydrogen, or in an atmosphere of a mixed gas containing at least a carbon-containing gas and a hydrogen gas, at a gas pressure between 0.1 and 5 Torr and a substrate temperature between 300° and 1000° C.
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