| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_260220c525b214105ee48ee2d77a5bf4 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-31743
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/D06M2101-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-23986 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/D06M15-347
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/D06M15-53
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/D06M15-263 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/D06M101-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/D06M101-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/D06M101-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/D06M101-34 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/D06M15-53
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/D06M15-263
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/D06M15-347 |
| filingDate |
1993-04-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
1994-09-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b28bd071174c614aa9a9091834f1137e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f8841cf0a3e124ab32cb254f2d7a12d7 |
| publicationDate |
1994-09-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-5348786-A |
| titleOfInvention |
Method and composition to enhance acid dye stain resistance of polyamides by improving resistance to detergent washings and products thereof |
| abstract |
A method of imparting acid dye stain resistance to polyamide substrates having improved durability of the stain resistance to detergent washings comprising treating the polyamide substrate with an effective amount of a mixture of phenyl vinyl ether/maleic diacid copolymer and 2-(4-hydroxymethyl-phenoxy)-ethyl vinyl ether/maleic diacid copolymer, wherein the phenyl vinyl ether/maleic diacid copolymer is the stain resist agent, and the 2-(4-hydroxymethyl-phenoxy)-ethyl vinyl ether/maleic diacid copolymer is added to improve the durability of the stain resist agent. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7785374-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7276085-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7488351-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7914890-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005015886-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8883035-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9845448-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009162682-A1 |
| priorityDate |
1991-02-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |