Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_79751aeaa9923745648e5ae7d9c35782 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0226 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 |
filingDate |
1991-04-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
1994-08-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_59acafebc366ededd9fbafbf961b383b |
publicationDate |
1994-08-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-5334481-A |
titleOfInvention |
Positive diazo quinone photoresist compositions containing antihalation compound |
abstract |
Addition of compounds of formula I ##STR1## in which R 1 to R 4 are each hydroxyl or C 1-6 -alkoxy and R 5 to R 10 are each hydrogen or C 1-6 -alkyl, n to positive photoresist compositions based on a diazoquinone/novolak resin effectively suppresses stray radiation and halation effects in corresponding photoresist coatings, in particular if these coatings have been applied to highly reflective substrates. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5958645-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9000222-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8202905-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9446127-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9562025-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5863709-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8236852-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0827024-A3 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0827024-A2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8710272-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008188557-A1 |
priorityDate |
1985-05-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |