| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-032
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G8-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K5-42 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G8-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-032 |
| filingDate |
1992-08-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
1994-01-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_081a8845a6b3575616582c6f33a37df7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7f08ea87295ed56b59dae70df070c234
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_042dbdedb708cde8839f4a19296a08fa
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e5051a036dd8878772b13ff3cefcd882
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7c4b112db6392682c62a545a93a4cfd9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fbb3e46230391982f2fea7b459be7d08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7781c815ad86ec41feb2a543fffc8f68
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dbdeb35ed9bb63e0b282d7997935ef68 |
| publicationDate |
1994-01-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-5281508-A |
| titleOfInvention |
Positive-working photoresist containing o-naphthoquinone diazide sulfonic acid ester and novolak resin consisting of 35 to 43% m-cresol and 65 to 57% p-cresol with substantial absence of o-cresol |
| abstract |
A positive-working photoresist composition suitable for fine patterning in the manufacture of semiconductor devices, e.g., VLSIs, with high fidelity is proposed. The composition comprises 100 parts by weight of a cresol novolac resin and 25-60 parts by weight of a naphthoquinone diazide sulfonic acid ester as the photosensitive component while the cresol novolac resin component is prepared from a mixture of cresol isomers composed of 35-43% of m-cresol and 65-57% of p-cresol with substantial absence of o-cresol or composed of 35-43% of m-cresol, 65-57% of p-cresol and 1% or less of o-cresol. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6210855-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S6235349-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6440646-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009227058-A1 |
| priorityDate |
1985-08-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |