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filingDate 1992-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 1993-11-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 1993-11-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-5260107-A
titleOfInvention Plasma chemical vapor deposition process for producing a hard multilayer coated product
abstract This present invention provides a hard multilayer coated product comprising a hard wear-resistant titanium compound coating layer, a titanium compound layer having a compositional gradient and a self-lubricating coating layer comprising hard amorphous carbon as the principal component successively formed on the surface of a substrate, the first layer being formed at about 500° C. by the plasma CVD method in a vacuum followed by the formation of the second and third layers at 250° to 400° C. in a vacuum maintained at the same level as above. The hard multilayer coated product is improved in wear-resistance and self-lubricity.
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