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http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09B69-106
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09B29-0813
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filingDate 1993-01-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 1993-10-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 1993-10-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-5250392-A
titleOfInvention Process of developing a negative-working radiation-sensitive photoresist containing cyclized rubber polymer and contrast enhancing azo dye
abstract A negative-working, radiation-sensitive composition comprising an admixture in a solvent of: n (a) at least one cyclized rubber polymer, n (b) at least one photoactive compound, and n (c) an effective contrast enhancing amount of at least one rubber-soluble azo dye containing a reactive acrylate or methacrylate group of formula (I): ##STR1## wherein Q is a reactive group of the structure ##STR2## wherein Y is either H or CH 3 ; wherein R 1 is either H, CH 3 , C 2 H 5 , CH 2 CH 2 CN, CH CH 2 OH or Q; n wherein R 2 is either H, CH 3 , OCH 3 , or NHCOCH 3 ; n wherein R 3 is either H, OCH 3 or OC 2 H 5 ; and n wherein X is selected from the group consisting of an unsubstituted or a substituted benzene, thiazole, thiophene, benzothiazole, benzoisothiazole, thiadiazole, and pyrazole moiety having, if substituted, 1-3 substituent groups selected from cyano, nitro, acetyl, and halogen groups; the amount of said cyclized rubber being about 90% to 99.5% by weight, the amount of said photoactive component being about 0.5% to about 10% by weight, based on the total solids content of said radiation-sensitive composition.
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priorityDate 1991-02-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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