| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1e70c0aeade92d7571d955d3b90ea06e |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2203-1394
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-0082
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2203-068
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2203-0577
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2203-0505
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-3452
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2203-0759 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-161
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-0094
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-281 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-34 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-16 |
| filingDate |
1991-12-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
1993-08-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_be1bf33400ccd5e0bfbfb164f49cfe1c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_058e3442f19de5cb0dc13fbf3804242e |
| publicationDate |
1993-08-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-5240817-A |
| titleOfInvention |
Lamination of a photopolymerizable solder mask layer to a substate containing holes using an intermediate photopolymerizable liquid layer |
| abstract |
A process is disclosed for applying a preformed photopolymerizable solder mask film and a photosensitive liquid to a printed circuit substrate containing a plurality of holes wherein reduced failure is obtained in photopolymerized areas of the solder mask film above the holes as determined after a soldering operation. The photosensitive liquid contains at least one ethylenically unsaturated compound capable of forming a high polymer by addition polymerization and a first photoinitiator system which has an absorption maximum in a first spectral region. The preformed photopolymerizable film contains at least one ethylenically unsaturated compound capable of forming a high polymer by addition polymerization and a second photoinitiator system, such that the preformed photopolymerizable film has an absorption maximum in a second spectral region and is activated by actinic radiation therein and has an absorption minimum in the first spectral region and transmits actinic radiation therein. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5863597-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6037096-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007275320-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6517895-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5368987-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2022082954-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8476000-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5726348-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7879525-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6015520-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6146002-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2021073051-A1 |
| priorityDate |
1991-12-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |