Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fdad00677b9268c26e005a9e03a7b9dd |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-095 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-095 |
filingDate |
1991-10-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
1993-02-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_684603305ef540f9e5ce22f16fcc0abd http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3197c8f62fe2fa0decb5ec536e2aeb2c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_90162de16c5826e82b537c1f9ce20f13 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3f18c0c0b15d4c063d70d95dbbcec0d6 |
publicationDate |
1993-02-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-5188924-A |
titleOfInvention |
Pattern forming method utilizing material with photoresist film underlayer and contrast enhancement overlayer containing photosensitive diazonium salt |
abstract |
A pattern forming method, comprising the steps of providing a resist film on a substrate; providing a photosensitive film containing a photosensitive diazonium salt on the resist film; and then subjecting the resultant composite to pattern exposure by use of a light to which both of the resist film and the photosensitive diazonium salt are sensitive, can employ a composition for pattern formation which comprises a photosensitive diazonium salt, a resin binder and a solvent. By this method, a minute pattern of 1 mu m or less can be formed, utilizing effectively the UV-ray exposure technique of the prior art, with good dimensional precision and stability. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007039185-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7910223-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6760960-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006106160-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2003090173-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2004192876-A1 |
priorityDate |
1984-05-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |