| abstract |
A novel calixarene derivative, viz. acetylated methyl-calix[n]arene (n is from 4 to 8), exhibits high solubilities in various organic solvents. A film of this compound can easily be formed by a conventional solution coating method such as spin coating, and the obtained film is hard and heat-resistant. A pattern of negative type can be formed in the obtained film by selectively irradiating the film with a high-energy ray such as ion beam, electron beam or X-ray to polymerize and insolubilize the irradiated regions and then removing the unirradiated region by dissolution in an organic solvent. |