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classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-322
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32
filingDate 1990-09-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 1992-06-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4d3f937d22e1bbbe473be30080d187ef
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9552bf145df3f1884d1021efce80f233
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8e54d207251aad05f9887ed48f080cf9
publicationDate 1992-06-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-5126230-A
titleOfInvention High contrast, positive photoresist developer containing alkanolamine
abstract Compositions and methods for developing quinone diazide positive-working photoresists. The compositions consist essentially of an aqueous solution of a tetraalkylammonium hydroxide and an adjunct having a structure selected from: <IMAGE> and <IMAGE> wherein n is 0 or 1; m is 1 or 2; and each R1 and R2 is independently selected from hydrogen, methyl, or ethyl, but in Structure I the two R2's are not both ethyl. The methods involve use of this composition to develop the indicated photoresists. The addition of an adjunct of the indicated type prevents the formation of irregular deposits on the edges of unexposed portions of the photoresist lines when the photoresist is developed. Selection of these adjuncts also increases the uniformity of line widths of photoresist lines developed according to the present invention, and increases the process latitude of the developer.
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priorityDate 1987-04-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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