| abstract |
A method for forming a silicon dioxide film according to the present invention comprises steps of: (i) contacting a substrate with processing solution containing silicofluoric acid solution supersaturated with silicon dioxide, and (ii) forming the silicon dioxide film on the substrate; wherein organic colorant(s) is/are introduced into the silicon dioxide film by adding organic colorant(s) to the processing solution. According to the present invention, a silicon dioxide film containing organic colorant without defect such as air bubbles, or undecomposed raw material. |