| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2cb72657cf0479385a9b5e655af1e16f |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24868
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24851
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24802
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-31504
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-31928
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-239
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-21
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24876
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S428-913
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S428-901
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24917 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-48 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-48
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-00 |
| filingDate |
1988-06-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
1991-09-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cfa7e83fd9c1ff3fd6174bddf19f546a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ecb289f841ee4977df3a92e80f506109 |
| publicationDate |
1991-09-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-5051295-A |
| titleOfInvention |
Protective film for photo masks and lith films |
| abstract |
The present invention relates to a durable pattern forming material having a protective film comprising a radiation cured product of a curable compound, comprising a phosphazene of the formula: n n --{NP(x) (Y)}.sub.n -- n n wherein at least one of x and y is a polymerizable group and n is at least 3, superior in mechanical, optical and chemical properties which is characterized in that a cured protective film of a curable compound is formed on a photo mask or lith film on which a pattern of desired shape has been provided. This pattern forming material can be suitably used for formation of pattern in production of IC, printed circuit and hybrid IC. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9752022-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006078819-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2004265704-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7169534-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10703131-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11485162-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5391446-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7087297-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5213880-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5278009-A |
| priorityDate |
1987-08-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |