| abstract |
In a process for preparing a photopolymer printing plate, relief plate or photoresist from a photosensitive recording element containing n A) a photopolymerizable relief-forming layer which can be developed with liquid developer after imagewise exposure to actinic light, n B) a top layer which consists of polymers forming films of high tensile strength, adheres firmly to the photopolymerizable relief-forming layer (A) and is soluble or swellable in the liquid developers and n C) a cover sheet which can readily be peeled off from the top layer (B), n comprising peeling off the cover sheet (C) from the top layer (B), imagewise exposing to actinic light and developing the relief-forming layer (A), the formation of an electrostatic charge on top of the photosensitive recording element being prevented by incorporating into the element a top layer (B) containing specific tertiary amines and/or amides and/or specific quaternary ammonium salts. |