| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5539e85987921f605c2435d0251b02b6 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0236
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G8-04 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G8-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023 |
| filingDate |
1989-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
1991-03-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9552bf145df3f1884d1021efce80f233
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9c2b2182fd81188f7ca835fec3b3f02c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1648d58d3723fbc0cdcaab358736f07a |
| publicationDate |
1991-03-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-4997734-A |
| titleOfInvention |
Method of forming a thermally stable mixed aldehyde novolak resin containing resist pattern and that pattern on a substrate |
| abstract |
Novolak resins are provided which are the condensation product of (a) a phenol, phenol derivative, or mixtures thereof, and (b) a mixture of formaldehyde or a formaldehyde precursor and an aromatic aldehyde. When the aromatic aldehyde is a monohydroxy aromatic aldehyde, the novolak resin is especially useful in positive photoresist formulations. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5208138-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5182184-A |
| priorityDate |
1988-08-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |