Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_805883408c251b3b421ba4bcfb2c0eb7 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J37-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01B7-0706 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01B7-0712 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J27-122 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01B7-07 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J37-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D3-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J27-122 |
filingDate |
1989-05-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
1991-01-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2f19162672491c629ddcb7d207adc97e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e5b50e350c38192629fb98cfd90183ab http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d8f8de65a845beb5711aab77672e232f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_42242f2b1e423efeb09aa3ec8988ab40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e718093d47b193819501e4209cc76c67 |
publicationDate |
1991-01-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-4986975-A |
titleOfInvention |
Process for purifying hydrogen chloride from pyrolysis of 1,2-dichloroethane |
abstract |
The invention is a multi-stage process for purifying hydrogen chloride containing acetylene and ethylene, from pyrolysis of 1,2-dichloroethane to provide highly pure hydrogen chloride for use in the preparation of silicon compounds. In the first stage, unsaturated by-products are chlorinated by reaction with an excess of chlorine gas. In the second stage, the unreacted chlorine gas remaining in the hydrogen chloride is reacted with an excess of defined olefins or chloroolefins and the hydrogen chloride is separated from the chlorination products and the excess olefins or chloroolefins by low-temperature rectification under pressure. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-03089370-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2004027019-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2004163411-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5437711-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006177341-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-1328154-C http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7555917-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6719957-B2 |
priorityDate |
1988-05-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |