http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4973381-A
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0e433c1625fc509a087c912b440da84b |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67069 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-30 |
filingDate | 1989-02-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 1990-11-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_59648256fb9cc11d117a3285cbbfa62d |
publicationDate | 1990-11-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | US-4973381-A |
titleOfInvention | Method and apparatus for etching surface with excited gas |
abstract | A system (10) is provided for etching a surface (14). A vacuum enclosure (12) is provided to create a vacuum around containers (13) and the surface to be etched (14). A pressurized gas source (16) is utilized to input gas into the containers (13). A wire coil (38) is wrapped around the containers (13) and provided with an oscillator (40) to generate radio frequency energy. The radio frequency energy excites the gas within the containers (13) which is then discharged through an output opening (46) toward the surface to be etched (14). A vacuum pump (20) is provided to evacuate the enclosure (12). |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5280154-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5750211-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5658425-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5269879-A |
priorityDate | 1987-11-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 24.