http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4973381-A

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0e433c1625fc509a087c912b440da84b
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67069
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-30
filingDate 1989-02-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 1990-11-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_59648256fb9cc11d117a3285cbbfa62d
publicationDate 1990-11-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-4973381-A
titleOfInvention Method and apparatus for etching surface with excited gas
abstract A system (10) is provided for etching a surface (14). A vacuum enclosure (12) is provided to create a vacuum around containers (13) and the surface to be etched (14). A pressurized gas source (16) is utilized to input gas into the containers (13). A wire coil (38) is wrapped around the containers (13) and provided with an oscillator (40) to generate radio frequency energy. The radio frequency energy excites the gas within the containers (13) which is then discharged through an output opening (46) toward the surface to be etched (14). A vacuum pump (20) is provided to evacuate the enclosure (12).
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5280154-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5750211-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5658425-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5269879-A
priorityDate 1987-11-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

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Total number of triples: 24.