http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4929537-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03627f82d4edc6567f9627df6efdde5d |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0125 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-012 |
| filingDate | 1989-07-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 1990-05-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0208aec765b2893d353cbb198814b4b8 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_970835e190a1cf59a94900f97604aa4c |
| publicationDate | 1990-05-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | US-4929537-A |
| titleOfInvention | Photoresist compositions based on hydroxystyrene copolymers |
| abstract | Negative photoresist compositions are made from copolymers of 4-hydroxystyrene and dialkyl muconates, alkyl sorbates, alkadiene monomers or allyl esters of ethylenically unsaturated acids plus a photosensitizer. Such compositions are useful in photolithographic and photomasking operations in fabricating microelectronic devices, printed circuits, semiconductors, printing plates, dies and the like. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6117624-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6451502-B1 |
| priorityDate | 1988-01-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 107.