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filingDate 1987-04-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 1990-01-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_191448d243268122294a169672fe875c
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publicationDate 1990-01-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-4891296-A
titleOfInvention Pattern transfer method and silver halide photographic plate to be used for said method
abstract A silver halide photographic plate and a pattern transfer method comprising forming an original picture pattern on a first photographic plate having a silver halide emulsion layer on a glass support and contact transferring the original picture pattern onto a second photographic plate having a silver halide emulsion layer on a glass support or a substrate having a photoresist layer, characterized in that the first and second photographic plates comprise a silver halide emulsion contained in the emulsion layer which is a silver iodobromide emulsion containing 8 mol % or less of silver iodide and with its mean grain size being 0.1 mu m or less; or contain a silver halide emulsion in the emulsion layer which contains 50 mol % or more of silver chloride; and that at least one of the first and second photographic plates has an emulsion layer with surface roughness of 0.3 mu m to 3 mu m, and a silver halide photographic plate to be used for the method. By forming a pattern or a photoresist pattern according to the present invention, a copied pattern of good image quality can be obtained and also the aspirating evacuation time can be reduced.
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