| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5de41645f886d763d3f73e3d3fc113cf |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D3-665 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D3-66 |
| filingDate |
1988-08-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
1989-11-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1b3abe6d51bb4f3431d50802de7f0122
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8999dc7a27fcf45bfe0fc5c0f58e0bed |
| publicationDate |
1989-11-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-4883567-A |
| titleOfInvention |
Method of plating metallo-gallium films |
| abstract |
Electrocodeposition of uncontaminated metallo-gallium films (e.g., Ga-As) from a melt consisting essentially of GaCl3-dialkylimidazolium chloride and a salt of the metal to be codeposited with the gallium wherein (1) the alkyl groups comprise no more than four carbons, (2) the molar ratio of the dialkylimidazolium chloride to the GaCl3 is at least 1 but less than about 20, and (3) the molar ratio of the metal salt to the GaCl3 is less than 0.5. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9017541-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9263610-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012227811-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6406677-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5264111-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012128968-A1 |
| priorityDate |
1988-08-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |