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classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C51-265
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C63-14
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C51-487
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07B61-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C51-265
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C63-26
filingDate 1988-04-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 1989-10-31-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_31a489c2b0586581cceb8ac4d60f3196
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ca226eb0d0d15d3c0b92218bc3616a61
publicationDate 1989-10-31-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-4877900-A
titleOfInvention Process for preparing terephthalic acid of high quality
abstract The present invention provides a process of preparing terephthalic acid of high quality which is characterized by: oxidizing p-xylene with molecular oxygen in an acetic acid solvent in the presence of a catalyst comprised of at least one heavy metal and bromine at a temperature of from 180 DEG to 230 DEG C. to convert at least 95 wt % of the p-xylene into terephthalic acid and, optionally, subjecting the resultant reaction mixture to low temperature post-oxidation with molecular oxygen at temperatures lower than the temperature of the first oxidation reaction, thereby obtaining a slurry containing terephthalic acid particles whose spectral reflectance defined below is not less than 70% and whose reflectance ratio (400/500) defined below is not less than 0.92; subjecting the slurry to high temperature post-oxidation with molecular oxygen at a temperature of from 235 DEG to 290 DEG C. and then to crystallization; and collecting the resultant terephthalic acid from the reaction mixture. Spectral reflectance=a spectral reflectance at 500 nm determined according to a white light illumination method. Reflectance ratio (400/500)=(spectral reflectance at 400 nm)/(spectral reflectance at 500 nm).
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