http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4640891-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-156 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03C8-4086 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03C8-4033 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03C1-49845 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C8-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-498 |
| filingDate | 1985-08-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 1987-02-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_98fcd2bd7834792d5dd67c78351d2363 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bc12421aa3af057f769cfeedd6962483 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7727635aeecb33f97b35e7fd9eda53ea http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_503124549c3433fdbccb4b78e14f1dc5 |
| publicationDate | 1987-02-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | US-4640891-A |
| titleOfInvention | Heat developable light-sensitive material |
| abstract | A heat developable light-sensitive material having an excellent stability with time and capable of providing a high quality image is disclosed, which contains a base precursor represented by the following general formula (I): <IMAGE> (I) wherein A represents an organic residue represented by the following formula (II): <IMAGE> (II) X represents an electron attractive substituent having a Hammett's sigma value of more than 0; l represents an integer of 1 to 5 and, when l represents 2 or more, a plurality of Xs may be the same or different; Y represents a substituent having a Hammett's sigma value of 0 or less; k represents an integer of 0 to 5 and, when k represents 2 or more, a plurality of Ys may be the same or different; Z represents a divalent organic residue selected from the group consisting of -C=C-, -O-, -S-, and -NR- (wherein R represents a hydrogen atom or a substituent selected from the group consisting of an alkyl group, an alkenyl group, an aralkyl group, an aryl group, and an acyl group); the broken line in the general formula (II) represents that the cyclic compound containing Z may optionally be fused with a benzene ring; B represents a mono- or diacidic base having a pKa value of 7 or more and containing 12 or less carbon atoms; and n and m represent an integer of 1 or 2 and are in such relation that the number of positive charge is equal to that of negative charge. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4758503-A |
| priorityDate | 1984-08-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 180.