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http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-20
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filingDate 1985-02-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 1986-11-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2dbd3c6140155ab5ec888018730cde5b
publicationDate 1986-11-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-4623426-A
titleOfInvention Low temperature process for depositing epitaxial layers
abstract The specification discloses a low temperature process for depositing an epitaxial layer of a selected oxide or a selected sulfide material on a chosen substrate. The substrate is exposed to a chosen vapor phase reactant in the presence of neutral, charge-free oxygen atoms or sulfur atoms to produce a reaction between the atomic species and the vapor phase reactant to form the desired oxide or sulfide and induce the crystalline growth thereof as an epitaxial layer on the surface of the substrate. The atomic oxygen or the atomic sulfur is formed at a low temperature by the photochemical dissociation of a selected oxygen-containing precursor or a selected sulfur-containing precursor, respectively.
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priorityDate 1982-06-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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Total number of triples: 54.