Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_be055db3c1a09879df07379ba969e223 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T29-49082 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D11-101 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D4-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G11B5-7026 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F20-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G11B5-7023 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G8-32 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D4-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G8-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D11-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G11B5-702 |
filingDate |
1984-06-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
1986-07-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a5ba5a7dcd6d949a6071f0ecad9dbaa9 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3a573c59a0811e88187b8099dcf7b281 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_682b39eab04a644568a55e4c184d7186 |
publicationDate |
1986-07-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-4603162-A |
titleOfInvention |
Radiation curable resin, paint or ink vehicle composition comprising said resin and magnetic recording medium or resistor element using said resin |
abstract |
A resin having a monomer unit structure represented by the formula: ##STR1## can be cured by an actinic irradiation such as electron beam, ultraviolet ray or infrared ray to give a heat-resistant, moisture-resistant, acid- and alkali-resistant and solvent-resistant film which is especially suitable for a paint vehicle resin for use in resistor element or magnetic recording medium. A composition comprising said resin modified by incorporating at least of one monomer or oligomer containing at least one acryl, methacryl or allyl group therein for facilitating the control of the characteristics of a resistor element obtained by using said composition is also disclosed. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113861753-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5968605-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113861753-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7373747-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5004842-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6306929-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6001898-A |
priorityDate |
1983-06-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |