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filingDate 1982-12-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 1986-04-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 1986-04-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-4583105-A
titleOfInvention Double heterojunction FET with ohmic semiconductor gate and controllable low threshold voltage
abstract This invention relates to an improved heterojunction FET. More specifically the invention is directed to a heterojunction FET device in which the contact to the semiconductor gate is ohmic in character. The gate and channel regions of the FET have the same barrier height relative to an intervening third layer of semiconductor and sandwich the third layer of undoped semiconductor. The resulting symmetry of the structure provides a threshold voltage which lies normally near zero volts and is controllable upwardly or downwardly by adding an n or p type dopant to the undoped third layer or region.
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