| abstract |
A process of forming a polyimide pattern on a base plate, which comprises exposing imagewise a layer of photosensitive polyimide precursor on the base plate, removing unexposed areas by developing and curing the resultant pattern of the polyimide precursor, characterized by employing a developer containing (A) at least one solvent selected from the group consisting of N,N-dimethylacetamide, N-methyl-2-pyrrolidone, N,N-dimethylformamide, dimethylsulfoxide and γ-butyrolactone, (B) methanol and (C) at least one solvent represented by the formula; n n R.sup.1 OCH.sub.2 CH.sub.2 OCH.sub.2 CH.sub.2 OR.sup.2 n n wherein R 1 is a hydrogen atom or R 2 and R 2 is an alkyl group having 1 to 4 carbon atoms. |