Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-162 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03C1-307 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03C1-7614 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-52 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-54 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F226-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-76 |
filingDate |
1984-03-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
1985-04-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_faafd154471bd4f2d6ed47e46aaf9a19 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bcbc00a6fe8012754881edb3bdcfa50d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4aebf47064f4b4caf721a7b0c82975f4 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fb39a108d2d46d9ec2287cee762172c6 |
publicationDate |
1985-04-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-4508818-A |
titleOfInvention |
Silver halide photographic sensitive materials |
abstract |
A silver halide photographic sensitive material is disclosed. The material is comprised of a support base which has a sensitive silver halide emulsion layer on the surface of the base. On the silver halide emulsion layer is a first and a second insensitive layer. The second insensitive layer has a melting time which is higher than that of the first insensitive layer. The first insensitive layer has a melting time which is equal to or higher than the melting time of the silver halide emulsion layer. The resulting material can be advantageously utilize within an automatic developing apparatus. The material has improved mechanical properties and results in a reduced amount of scum being formed within the developing solution. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5876908-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4590151-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-105431411-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4777113-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4879204-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5576155-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5837437-A |
priorityDate |
1981-06-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |