| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e757fd4fedc4fe825bb81b1b466a0947 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-36 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-36
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
| filingDate |
1983-10-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
1985-02-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_41f3ea44b3c22eec3733ecbf5920b83b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_03c0fb135e26f5336d0fdcdcd85b0062 |
| publicationDate |
1985-02-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-4497891-A |
| titleOfInvention |
Dry-developed, negative working electron resist system |
| abstract |
A process for producing a resist pattern by dry development using a resist comprising from 70 to 50% by weight of a novolac resin and from 30 to 50% by weight of a poly(ether pentene sulfone). |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5981143-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4588675-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6045978-A |
| priorityDate |
1983-10-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |