| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-162
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-151 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03C5-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03C1-95 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-95
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C5-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-76 |
| filingDate |
1981-07-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
1983-08-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3074e9dd9036942fa4e7a7896a8892ed
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a37d17e7192da5512669116e22f0821c |
| publicationDate |
1983-08-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-4396706-A |
| titleOfInvention |
Silver halide photographic light-sensitive material and image forming method |
| abstract |
A silver halide photographic light-sensitive material is described containing in its outermost layer a high molecular weight matting agent formed from at least one kind of alkali insoluble synthetic polymer grains having a glass transition point of at least 60 DEG C. and an average grain size of from 0.2 to 10, and said polymer is represented by the formula (I): -A)x (B)y (C)z (I) wherein A represents a divalent group derived from at least one monomer having the formula (II); B represents a divalent group derived from at least one monomer having the formula (III), whose homopolymer has a glass transition point of at least 50 DEG C.; C represents a divalent group derived from an ethylenic unsaturated monomer other than A or B which is capable of copolymerizing with the monomers forming both A and B; x represents the fractional content of group A, which ranges from 0.005 to 0.20 mol/mol of polymer of formula (I); y represents the fractional content of group B, which ranges from 0.50 to 0.995 mol/mol of polymer of formula (I); and z represents the fractional content of group C, which ranges from 0 to 0.495 mol/mol of polymer of formula (I). Formula (II) and formula (III) are disclosed herein. These polymer grains are not removed from the outermost layer by rapid development-processing and exhibit a satisfactory matting effect even after the completion of such processing. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1750173-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5968555-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5028516-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5378577-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0693710-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0589460-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4766059-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4820615-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4524131-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5288598-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5254441-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5723275-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5298376-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5482815-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6025111-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5556738-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0692391-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113406863-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5380637-A |
| priorityDate |
1980-07-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |