http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4377734-A

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5d7576285d411d00c697e07270d2814a
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31155
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31144
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3215
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32137
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32136
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-302
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3215
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3213
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3115
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-311
filingDate 1980-10-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 1983-03-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5c1f08b1b616994d2751a92dc59d2937
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f4e35cb26b417525f5abe9fa2da225e4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a7c022675f239efde1803f0cf4916452
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_88fab23f944826a71e0fb7cc3907573e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_85d6dd1368f5389500af84305c60ea1d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_66704e86348b97a11f833db750621793
publicationDate 1983-03-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-4377734-A
titleOfInvention Method for forming patterns by plasma etching
abstract Ions of a metal which becomes passive under the presence of oxygen with regard to plasma etching are implanted into selected portions of the surface of a workpiece, after which the workpiece is subjected to plasma etching with a reaction gas mixed with oxygen, whereby that layer which has been rendered passive acts as a mask, and an etched pattern is formed.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4880493-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005100673-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4968552-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6540928-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5186788-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4554728-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6960541-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4601778-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6576152-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5236547-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4803181-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6863930-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6547975-B1
priorityDate 1979-10-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4243506-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4093503-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4074139-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4092209-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4057895-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4108715-A
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5943
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID451818717
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419527288
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID123105
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419524915
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419523291
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419491804
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5352426
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23936
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23964
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID71350790
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419577475
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID457707758
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24261
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419530175
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID454372570
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID9989226
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID977
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID425762086
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5359268

Total number of triples: 66.