| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_79751aeaa9923745648e5ae7d9c35782 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08B37-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F8-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G85-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0388 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08B31-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08B37-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08B15-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08H1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G85-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G81-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F8-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-48
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F8-00 |
| filingDate |
1981-03-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
1983-03-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8e0703c2a915861fc13b947ea6194a89
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_faab4fe3249e1ed3222aa302baff6dc8 |
| publicationDate |
1983-03-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-4377668-A |
| titleOfInvention |
Photo-crosslinkable polyamide with side tricyclic imidyl groups |
| abstract |
Photo-crosslinkable, novel polymers with side tricyclic imidyl groups, for example those of the formula <IMAGE> are described. The novel photo-crosslinkable polymers are suitable for photo-mechanical applications, for example for the production of printing plates for the offset printing process and especially as photo-resists. They have high UV absorption and ensure a high rate of crosslinking even without the addition of photosensitizers. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4544621-A |
| priorityDate |
1978-02-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |