| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6db78e3c1e9bf1b878d149a4db7c019d |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
| filingDate |
1981-08-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
1983-01-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1443716c544c5c946d773967b74cbd4e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_101607c02d901b407e3d3f189d41a26b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_741d8ba1b1a966a9043908117af4a9bd |
| publicationDate |
1983-01-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-4367281-A |
| titleOfInvention |
Fine fabrication process using radiation sensitive resist |
| abstract |
A fine work process comprises forming a thin film made of a radiation sensitive polymer on a board; irradiating radiation; developing and etching the product. The radiation sensitive polymer comprises at least 10 wt. % of a polymer having repeat units: ##STR1## wherein R and R' respectively represent hydrogen atom or an alkyl group and n is an integer of number of substituent groups. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4690880-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5015558-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5368783-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5286762-A |
| priorityDate |
1981-01-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |