Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_cd8dff0cc6d024e095d5decaf9202f49 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
filingDate |
1981-02-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
1982-08-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4d86510da5d109d34d24a89205c0dc5e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0d6adc0971936d77b683b123694c9690 |
publicationDate |
1982-08-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-4343889-A |
titleOfInvention |
Process of exposing and developing terpolymer photosensitive bodies |
abstract |
A photolithographic resist with excellent sensitivity for actinic radiation in the short wavelength ultraviolet region is produced from terpolymers of (1) methyl methacrylate, (2) materials such as 3-oximino-2-butanone methacrylate, and (3) compounds such as methacrylonitrile. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4812542-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007243354-A1 |
priorityDate |
1981-02-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |