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filingDate 1981-02-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 1982-08-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0d6adc0971936d77b683b123694c9690
publicationDate 1982-08-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-4343889-A
titleOfInvention Process of exposing and developing terpolymer photosensitive bodies
abstract A photolithographic resist with excellent sensitivity for actinic radiation in the short wavelength ultraviolet region is produced from terpolymers of (1) methyl methacrylate, (2) materials such as 3-oximino-2-butanone methacrylate, and (3) compounds such as methacrylonitrile.
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