| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d2051317369a779747701bc0ebe411a4 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-168
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24835 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G75-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G75-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G75-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G75-00 |
| filingDate |
1980-11-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
1982-05-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_86207515070b3e70af0d975f51b12bf7 |
| publicationDate |
1982-05-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-4330671-A |
| titleOfInvention |
Positive resist for electron beam and x-ray lithography and method of using same |
| abstract |
Copolymers of an aziridine and sulfur dioxide are disclosed which are useful as positive radiation resists for use in electron beam and x-ray lithography. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5110709-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10177001-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2017345648-A1 |
| priorityDate |
1979-09-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |