| abstract |
Aromatic polyamide film, having an excellent thermal resistance and a high dielectric breakdown strength, which comprises an aromatic polyamide containing repeating units of the formula --NH-Ar1-CO-- or --NH-Ar1-NHCO-Ar2-CO-- and cross-linked with a cross-linking compound having at least one radical selected from R1-C(R2)=C-CH2(R3)-, R1-C(R2)=CR 3-, R1-C(R2)=C(R3)-COO- and R1-C(R2)=C(R3)-CONH-, or another cross-linking cyanuric or isocyanuric acid compound, by means of heat, ultraviolet rays or electron beam. |