| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e757fd4fedc4fe825bb81b1b466a0947 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-136 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-162 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-16 |
| filingDate |
1977-02-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
1981-07-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_94e01398fa0125d44cc3e88aa977f889
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bd501c7037b9f82b358a8b21620af2fd
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3387be6cbdf9f3b80d5c90df3f6b9a58
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_099f3322ab7644fe5602ecd1eda6bbd3 |
| publicationDate |
1981-07-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-4281057-A |
| titleOfInvention |
Variable pre-spin drying time control of photoresists thickness |
| abstract |
Resist is applied to a surface with a syringe, or other suitable dropper, equipped with a millipore filter to remove contaminants. The surface is completely flooded with resist. Resist is allowed to remain on the surface of the evaporated metal for a period of time prior to spin coating. Allowing resist to remain on the surface prior to coating produces a uniform film. For a 2 micron thick uniform resist coating, a minimum of 15 seconds is allowed prior to spinning while in the case of a 4 micron thick resist coating a much longer period is allowed. For the application of a 2 micron film, the resist material after partial drying for approximately 15 seconds is spun at 2000 rpm for 30 seconds. In order to apply a 5 micron thick resist film, resist is spun at 2000 rpm for 30 seconds after partial drying for approximately 10 minutes. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4594473-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-105323953-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4741926-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0558102-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5622747-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2013043127-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5368987-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5626782-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0558102-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6375063-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4423137-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5360696-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-9930840-A1 |
| priorityDate |
1976-06-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |