| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d2051317369a779747701bc0ebe411a4 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2203-0786
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2203-1157 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-064 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 |
| filingDate |
1979-03-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
1980-10-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_01f2627dbc962b0bdfb4390a50487180 |
| publicationDate |
1980-10-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-4230794-A |
| titleOfInvention |
Improving etch resistance of a casein-based photoresist |
| abstract |
The etch resistance of a casein-based photoresist pattern to low specific gravity ferric chloride based etchant solutions is increased by treating the photoresist pattern with a formaldehyde solution containing at least 10 percent formaldehyde by volume by a period of at least 30 seconds, and thereafter drying the photoresist pattern. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9371594-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7533463-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2013098773-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2013098755-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4865953-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005150107-A1 |
| priorityDate |
1979-03-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |