Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b634da39e324cf5c0ef67b35a5f7ef2b |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D3-562 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D3-56 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25C1-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D1-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D3-12 |
filingDate |
1977-05-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
1978-08-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1045259b56bfbb1c1127ca55b4fe4e92 |
publicationDate |
1978-08-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-4108740-A |
titleOfInvention |
Hard, heat-resistant nickel electrodeposits |
abstract |
An article such as a screen printing cylinder prepared from a hard nickel electrodeposit is characterized by improved resistance to embrittlement when exposed to temperatures above about 200 DEG C. Electrodeposits affording improved resistance to embrittlement contain 0.007-1% sulfur and 0.02-5% manganese. The amount of manganese in the electrodeposits is correlated to the amount of sulfur present so that the manganese is present in an amount in excess of the stoichiometric amount required to form manganese sulfide. The electrodeposits which are also characterized by usefully low levels of internal stress are prepared using conventional nickel plating baths modified by the addition of sources of manganese ions and sulfur. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9132687-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5282951-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0892087-A3 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7501241-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1344848-A3 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6814915-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1344848-A2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9044927-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7906210-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8673445-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2003173705-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005046758-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-0151110-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6372118-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8578931-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2013014656-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6344128-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2018298510-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10400347-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011219971-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7147201-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0892087-A2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011014493-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008008870-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005127267-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2002011247-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4383896-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-103160868-A |
priorityDate |
1976-05-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |