| abstract |
Disclosure is made of an electrochemical process for producing manganese dioxide by electrolyzing a solution containing 100 to 200 g/l of manganese sulphate and 20 to 100 g/l of sulphuric acid. The temperature of the solution is 90° to 98° C, and the anode current density is 100 to 300 A/m 2 . The anode is of titanium. On the surface of the anode there are provided uniformly spaced hollows whose total surface area is not less than 10 percent of that of the anode. Inside said hollows there is provided a coating consisting of two layers. The first layer is 0.8 to 5 mu thick and is of a metal selected from the platinum family; it may be of ruthenium dioxide or platinum oxide. It also may be of lead dioxide, in which case this first layer is 0.1 to 1 mm thick. The second layer has a thickness of 1 to 2 mm and is of manganese dioxide. The cathode is of chromium-nickel steel containing 18 to 23 mass percent of chromium, 20 to 28 mass percent of nickel, and alloy additions, including copper, molybdenum, titanium, silicon and manganese. n The proposed process yields manganese dioxide which is used as paste of positive electrodes of manganese-zinc voltaic cells. |