http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4049457-A
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e70300ec13bbd25b6b19c20419a0ca38 |
classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-11 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03C1-733 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03C1-73 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-73 |
filingDate | 1976-10-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 1977-09-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_eb1e99fcd9c1596d0c55358eb92bfd6b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b4ea70235b820836d70dc8de6a8b097a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_43f135f5b716b950379a48d644e3e077 |
publicationDate | 1977-09-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | US-4049457-A |
titleOfInvention | Photosensitive composition of polynitrate ester, aromatic amines and organic esters |
abstract | Photosensitive compositions containing nitrate ester chain polymers, such as nitrocellulose, molecularly intimately admixed with at least one compound having a free basic amine group, preferably a primary amine group, directly attached to an aromatic ring carbon and also containing an organic acid. On suitable exposure to ultraviolet light, such compositions will print out a useful image directly, or, should a much lesser light exposure be preferred, they can be developed and fixed to an image intensified to useful strength by either heat alone, for amines that are sufficiently volatile at ingredient reaction temperatures, or by solvent selective removal of ingredients from unexposed areas, and subsequently intensified either by heat or overall ultraviolet exposure. Exposed areas of such compositions are more resistant both to volatilization of the amines and to solvent removal than the non-exposed areas. High optical density is attainable using very thin coatings, permitting high resolution grainless images. If developed by solvent selective removal of all ingredients from unexposed areas, the composition is useful as a photoresist material. The presence of the organic acid provides increased contrast at lower exposures. |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4405705-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100557556-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4705534-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2003082481-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6753128-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4546063-A |
priorityDate | 1975-03-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 165.