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filingDate 1971-12-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 1976-07-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_26288ddaae68d3aa0f933495274afbe9
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publicationDate 1976-07-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-3969744-A
titleOfInvention Semiconductor devices
abstract A semiconductor device is described containing at least two insulating gate field effect transistors in a common wafer. One of the transistors exhibits high gain but the other transistor exhibits low gain as a result of selectively implanting into its channel neutral ions and crystal damage which reduce the effective mobility of charge carriers therein. In one embodiment, the low gain transistor serves as a load for the high gain transistor. In a second embodiment, the low gain transistor is a parasitic transistor formed between adjacent circuit elements.
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priorityDate 1971-07-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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