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http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-4835
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http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23G1-24
filingDate 1974-10-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 1976-05-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_107c6c1c6ce288132f50496737b1c49a
publicationDate 1976-05-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-3954498-A
titleOfInvention Aluminum foil cleaning process
abstract A process for preparing an aluminum foil for coating with photoresist for the purpose of preparing an etched strip for semiconductor assembly utilizing the step of cleaning said aluminum surface with a water solution comprising one to five percent ammonium persulfate, one to five percent sodium chlorate and one to three percent of a surfactant selected from the group consisting of dioctyl sodium sulfo succinate and dodecyl benzene sulfonate.
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priorityDate 1974-10-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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