| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a3593a335ede8bfed80bb10aef0e7ded |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01G25-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D13-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01F7-46 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01G25-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D13-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01F7-46 |
| filingDate |
1972-01-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
1975-01-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4df44c0a56e5a2ce8b7d89c4b6fc7a2f |
| publicationDate |
1975-01-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-3859426-A |
| titleOfInvention |
Method of purifying refractory oxides of aluminum and zirconium |
| abstract |
Refractory oxides such as alumina and zirconia are fired in a muffle furnace at elevated temperatures (above 1,000*C), cooled to room temperature and leached with hot deionized water until a rinse shows a pH of about 7.0 to 7.5. The material is then dried and stored in a dessicator until needed. This treatment removes most contaminating salts such as sulfate and sodium compounds which are present even in electronic grade refractory oxides and allows the use of low voltage-low current deposition systems. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2021260140-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2021260138-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2021260182-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2021259427-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2021260185-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022268348-A1 |
| priorityDate |
1972-01-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |