Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_13aa7b32ae00ed83af7dfaa0b6a1f7c2 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-126 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
filingDate |
1972-07-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
1975-01-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6f6c9d081a999248ba32c835acbdac31 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7a4bfd9a581ebbcc921a751eb75cb4d5 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_841df6170a2160e5cc5551bfce7caca2 |
publicationDate |
1975-01-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-3859098-A |
titleOfInvention |
Photoresist composition |
abstract |
A photoresist composition comprises a carboxy group-containing polymer, in which part or all of the hydrogen atoms have been substituted by an alkali metal, and a photoactivator having a polyhalogenated methyl group capable of yielding a free radical by action of light. The photoresist composition can be developed merely with water or hot water. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5155044-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4701390-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5141841-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101789556-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4025348-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5731206-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4590146-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-8703387-A1 |
priorityDate |
1971-07-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |