abstract |
The present invention relates to a process for the substantial removal of iodine and/or an organic iodine compound which has a low number of carbon atoms from a gas and/or vapour, wherein a gas or vapour containing the iodine and/or iodine compound is passed through a layer of porous particles of a sorption agent which particles comprise amorphous silicic acid and are impregnated with a metal salt, and which have only a low water adsorption and are resistant to hot steam and acid vapours. |