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filingDate 1967-05-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 1974-04-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7f5fd128541259938c5b7254bb1952a5
publicationDate 1974-04-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-3804621-A
titleOfInvention Negative or positive wash-off relief systems
abstract A wash-off relief system in which the residual portion of the light-sensitive gel coating exposed to a copy image may be either the light-struck (negative image) portion or the non-light-struck (positive image), at the option of the user. The coating includes a mixture of ferric double salts which, alone, normally do not insolubilize the gel coating, and ferric single salts which normally insolubilize the gel coating. To obtain a continous coating, the mixed salts are dispersed in the gel material in the presence of a volatile solubilizer (acid) sufficient to offset the insolubilizing effect of the ferric single salts, the solubilizer leaving the film coating during drying to provide a substantially insolubilized light-sensitive gel coating prior to exposure. Negative images are developed in a developer solution containing hydrogen peroxide and an acid (or a peroxide former and an acid) prior to wash-off. Positive images may be left by wash-off without use of a developer, but in some formulations, a positive developer solution containing salts of acids which solubilize the gel coating and salts of alkaline earth metals (particularly strontium and barium) may be used to aid wash-off.
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