| abstract |
(CH2=C(=R)-(COO-A-O)M-CO-NH-),(((LOWER-ALKOXY)N-PHENYL)- CH=CH-)BENZENE 1 STILBENES OF THE FORMULA WHEREIN N IS AN INTEGER FROM 1 TO 3, M IS AN INTEGER FROM 0 TO 1, A IS LOWER-ALKYLENE AND R IS HYDROGEN OR LOWERALKYL, ARE DISCLOSED, AS WELL AS HOMOPOLYMERS OF SAID COMPOUNDS, AND COPOLYMERS OF SAID COMPOUNDS WITH MONOMERS CONTAINING A POLYMERIZABLE CH2=C<. THE ABOVE STIBENES AND THE POLYMERS DERIVED THEREFROM ARE PHOTOSENSITIVE AND CA BE USED IN THE PREPARATION OF PHOTORESIST SYSTEMS. |