| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c902faf6ae746c51fc8010672fc22894 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F8-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-012 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F8-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F8-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F8-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-012
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 |
| filingDate |
1972-12-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
1974-02-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b41a88ee0cbd8c143a94ae42cb18e057
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_52e61ba09515ddac570be1fcbff9cee3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cb28b27d2e91c8fa9d32d77b4272bdd5 |
| publicationDate |
1974-02-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-3794626-A |
| titleOfInvention |
Radiation sensitive polymers |
| abstract |
HYDROPHOBIC RADIATION-SENSITIVE POLYMERS ARE PROVIDED WHICH ARE CHARACTERIZED BY THE RECURRING UNIT: -(CH(-COO-R2)-CH(-COO-R3)-CH(-O-R1)-CH2)- WHEREIN R1=STRAIGHT CHAIN ALKYL (C10-20), ONE OF R2 AND R3 IS HYDROGEN AND THE OTHER IS ((R")Y,(N3-O2S-)X-PHENYL)-NH-COO-A- WHEREIN A=ALKYLENE (C2-20), R"=LOWER ALKYL OR HALOGEN, X=1 OR 2, Y=0. 1 OR 2, X+Y$3. SALTS OF THE ABOVE COMPOUND ARE DISCLOSED AS WELL AS MODIFICATIONS OF THE ABOVE POLYMERS IS WHICH SOME RECURING UNITS CONTAN TERTIARY AMINO GROUPS. THE POLYMERS ARE USEFUL IN THE PREPARATION OF PHOTORESISTS HAVING HIGH RESISTANCE TO ATTACK BY ACID ETCHANTS. THE POLYMERS ARE ALSO USEFUL IN PRODUCTION OF LITHOGRAPHIC PLATES AND THE LIKE WHICH ARE TO BE USED WITH OLEPHILIC INKS. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0562952-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4315998-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6027849-A |
| priorityDate |
1972-12-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |