| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_cd8dff0cc6d024e095d5decaf9202f49 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-143 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0388 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
| filingDate |
1972-03-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
1973-11-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d713ca1a45633e4340d788af9203c4e6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bf1e334cd2495e98372962d38076cc35 |
| publicationDate |
1973-11-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-3770433-A |
| titleOfInvention |
High sensitivity negative electron resist |
| abstract |
A technique is described for the generation of a relief image in a sensitive negative electron resist based upon a modified polymer of glycidyl methacrylate alone or in combination with methyl methacrylate and/or ethyl acrylate. The described resist evidences optimum characteristics with respect to sensitivity, adhesion and resolution and is suitable for use as an etch mask in the fabrication of microelectronic devices. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4012536-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-3961101-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4011351-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-3847767-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4454222-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4980317-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4383026-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6777167-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4078098-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4299911-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2003228538-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4018937-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-8002752-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6989227-B2 |
| priorityDate |
1972-03-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |