| abstract |
This invention is directed to a solid photoresist composition comprising a polyene, polythiol and photosensitizer admixture which when coated on a substrate to be modified, e.g., ceramic, glass, metal oxide and metal surfaces and exposed imagewise to actinic radiation results in an insoluble cured polythioether photoresist in the exposed segments with the unexposed segments of the composition being removed in suitable solvents to allow etching of the metal thereunder. Optionally, the solid photoresist composition can be covered with a transparent film to insure cleanliness, which film can be removed before or after exposure as desired. |